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DOI:10.16418/j.issn.1000-3045.20220619002
中国科学院院刊:2023,38(2):324-332
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高水平科技自立自强下我国集成电路人才培养“痛点”与对策
管开轩1, 余江2,3, 周建中2,3, 陈凤3, 韩雁4
(1.中国工商银行 博士后科研工作站 北京 100140;2.中国科学院科技战略咨询研究院 北京 100190;3.中国科学院大学 公共政策与管理学院 北京 100049;4.浙江大学 微纳电子学院 杭州 311200)
Analysis on Bottleneck and Prospect of Integrated Circuit Talent Training Oriented to Sci-tech Self-reliance and Self-strengthening at Higher Levels
GUAN Kaixuan1, YU Jiang2,3, ZHOU Jianzhong2,3, CHEN Feng3, HAN Yan4
(1.ICBC Postdoctoral Workstation, Beijing 100140, China;2.Institutes of Science and Development, Chinese Academy of Sciences, Beijing 100190, China;3.School of Public Policy and Management, University of Chinese Academy of Sciences, Beijing 100049, China;4.School of Micro-Nano Electronics, Zhejiang University, Hangzhou 311200, China)
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投稿时间:2023-01-28    
中文摘要: 构建新发展格局最本质的特征是实现高水平科技自立自强。集成电路产业作为新发展格局下实现高水平科技自立自强的重要支柱,正面临严峻的“卡脖子”问题。中国“缺芯”之痛本质上始于人才之痛,产业总体层面发展不均等结构性问题导致人才聚集扩散效应更加难以有效形成。实现产业高水平自立自强要坚持需求导向和问题导向:不仅要关注集成电路核心技术创新,更要关注集成电路的人才供给体系。文章从我国集成电路人才培养阶段、流通阶段和结构性问题等维度,系统性剖析新形势下我国集成电路行业人才培养与发展体系的痛点,并提出形成分层次、多梯队和“需求—供给—流通”环节横纵协同的新型集成电路人才培养体系理论模型,为构建面向高水平科技自立自强的分层次、多梯队、应用性复合型集成电路人才培养发展体系提供决策参考。
中文关键词: 集成电路  人才培养  产教融合  科技自立自强
Abstract:The most essential feature of building a new development paradigm is to achieve sci-tech self-reliance and self-strengthening at higher levels. The integrated circuit industry, as an important pillar to achieve this essential feature, is facing a severe external situation. China's chip shortage pain begins with a shortage of talents. The structural problem of uneven development at the overall level of the industry makes it more difficult to effectively gather and distribute talents. To achieve sci-tech self-reliance and self-strengthening at higher levels, we need to be both demand-oriented and problem-oriented, which means not only to pay attention to the core technology innovation of integrated circuits, but also to develop the talent supply system. This study systematically analyzes the pain points of the talent training and development system of China's integrated circuit industry from the perspectives of talent training stage, circulation stage and structural problems, and proposes a theoretical model of forming a new integrated circuit talent training system that is hierarchical, multi echelon and horizontally and vertically coordinating "demand, supply and circulation" links. It aims to provide decision-making reference for building a hierarchical, multi echelon, practical and compound training system of integrated circuit talents in order to achieve sci-tech self-reliance and self-strengthening at higher levels.
keywords: integrated circuit  talent cultivation  integration of production and education  sci-tech self-reliance and self-strengthening
文章编号:     中图分类号:    文献标志码:
基金项目:国家自然科学基金重点项目(71834006),教育部哲学社会科学研究重大课题攻关项目(20JZD022),国家自然科学基金青年科学基金项目(72104227),中央高校基本科研业务费专项资金项目(E2E42112)
作者单位
管开轩1 中国工商银行 博士后科研工作站 北京 100140 
余江2,3* 中国科学院科技战略咨询研究院 北京 100190
中国科学院大学 公共政策与管理学院 北京 100049 
周建中2,3 中国科学院科技战略咨询研究院 北京 100190
中国科学院大学 公共政策与管理学院 北京 100049 
陈凤3 中国科学院大学 公共政策与管理学院 北京 100049 
韩雁4 浙江大学 微纳电子学院 杭州 311200 
Author NameAffiliation
GUAN Kaixuan1 ICBC Postdoctoral Workstation, Beijing 100140, China 
YU Jiang2,3* Institutes of Science and Development, Chinese Academy of Sciences, Beijing 100190, China
School of Public Policy and Management, University of Chinese Academy of Sciences, Beijing 100049, China 
ZHOU Jianzhong2,3 Institutes of Science and Development, Chinese Academy of Sciences, Beijing 100190, China
School of Public Policy and Management, University of Chinese Academy of Sciences, Beijing 100049, China 
CHEN Feng3 School of Public Policy and Management, University of Chinese Academy of Sciences, Beijing 100049, China 
HAN Yan4 School of Micro-Nano Electronics, Zhejiang University, Hangzhou 311200, China 
引用文本:
管开轩,余江,周建中,陈凤,韩雁.高水平科技自立自强下我国集成电路人才培养“痛点”与对策[J].中国科学院院刊,2023,38(2):324-332.
GUAN Kaixuan,YU Jiang,ZHOU Jianzhong,CHEN Feng,HAN Yan.Analysis on Bottleneck and Prospect of Integrated Circuit Talent Training Oriented to Sci-tech Self-reliance and Self-strengthening at Higher Levels[J].Bulletin of Chinese Academy of Sciences,2023,38(2):324-332.
 
 
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