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DOI:10.3724/j.issn.1000-3045.20250414004
中国科学院院刊:2025,40(5):879-887
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自主创新驱动下的高端装备制造突围路径——以高端光刻机工件台研发与产业化为视角
朱煜
(清华大学 机械工程系 北京 100084)
Breakthrough path of high-end equipment manufacturing driven by independent innovation——From perspective of R&D and industrialization of high-end wafer stage of lithography machine
ZHU Yu
(Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China)
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本文已被:浏览 434次   下载 38次
    修订日期:2025-05-13
中文摘要: 文章围绕高端光刻机工件台的研发与产业化展开研究,深度剖析中国高端装备制造业的发展状况与核心挑战。研究发现,我国高端装备制造业虽有规模扩张与技术创新成果,但在核心技术自主可控方面存在不足,面临技术创新与基础能力的双重瓶颈。通过分析光刻机工件台的自主创新实践,包括核心技术攻坚、基础能力突破、产业链协同和产学研支撑体系构建等方面,总结出高端装备制造业突破技术封锁的内在规律。进而,提出高端装备研发的通用方法,涵盖自主创新的双轮驱动路径、产业链协同创新生态、制度保障体系构建,以及创新体系的协同演化规律。文章揭示了技术跃迁、能力建构和制度适配的三重核心规律,为后发国家实现技术赶超提供了“中国范式”,对保障国家产业安全、推动制造强国建设具有重要参考价值。
中文关键词: 高端装备制造  光刻机工件台  自主创新  产业发展
Abstract:Focusing on R&D and industrialization of wafer stage of high-end lithography machine, this study deeply analyzes the development status and core challenges of China’s high-end equipment manufacturing industry. The study finds that although China’s high-end equipment manufacturing industry has achieved scale expansion and technological innovation, there are still deficiencies in the independent control of core technologies, facing the dual bottlenecks of technological innovation and basic capabilities. By analyzing the independent innovation practices of wafer stage, including aspects such as core technology breakthroughs, basic capacity enhancements, industrial chain collaboration, and the construction of industry-university-research support systems, the internal laws for the high-end equipment manufacturing industry to break through technological blockades are summarized. Furthermore, a general method for high-end equipment research and development is proposed, covering the dual-drive path of independent innovation, the collaborative innovation ecosystem of the industrial chain, the construction of an institutional guarantee system, and the collaborative evolution law of the innovation system. The research reveals the three core laws of technological leapfrogging, capacity building, and institutional adaptation, providing a “Chinese paradigm” for late-developing countries to achieve technological catch-up, which has important reference value for ensuring national industrial security and promoting the construction of a manufacturing powerhouse.
keywords: high-end equipment manufacturing  wafer stage  independent innovation  industrial development
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作者单位
朱煜 清华大学 机械工程系 北京 100084 
Author NameAffiliation
ZHU Yu Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China 
引用文本:
朱煜.自主创新驱动下的高端装备制造突围路径——以高端光刻机工件台研发与产业化为视角[J].中国科学院院刊,2025,40(5):879-887.
ZHU Yu.Breakthrough path of high-end equipment manufacturing driven by independent innovation——From perspective of R&D and industrialization of high-end wafer stage of lithography machine[J].Bulletin of Chinese Academy of Sciences,2025,40(5):879-887.
 
 
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